Nano Particles For Polishing

Nano Particles for Polishing

Nalco has aligned their colloidal silica manufacturing capabilities to deliver high purity innovative nanoparticles to meet the needs of the CMP slurry formulator.

• Ultra-high purity waterglass based nanoparticles
• Broad range of particle sizes, size distributions, and concentrations
• Engineered products designed to be stable across a broad pH range

Ready to use Polishing Slurries for Silicon Wafer Polish

Nalco manufactures colloidal silica-based polishing slurries that are widely used for the stock polish, edge polish and final polish steps in the manufacture of silicon wafers and other semiconductor substrates for microchips. These slurries are also used in the precision surface finishing of optics, watch crystals and other glass components.

Customers with interest in our innovative nanoparticles, please contact the Nalco Colloidal Technologies Group directly at for assistance.